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Research Activities

CMP and Post-CMP cleaning Chemistry

Development of cleaning chemistry:

  • Formulation and optimization of cleaning chemistries to enhance defect removal efficiency

  • Design of novel cleaning agents/formulations for post-CMP surface cleaning

Corrosion inhibition

  • Investigation of corrosion inhibition mechanisms to protect metal surfaces during cleaning

  • Development of corrosion inhibitors to minimize metal loss/galvanic corrosion in post-CMP cleaning

Anodic Dissolution MEchanism2.jpg

Reaction Mechanism Analysis of Electrochemical Systems

EEC.jpg

Electrical Equivalent Circuit Analysis of EIS data

Mechanistic Analysis of Hydrogen Evolution Reaction (HER)

Numerical Studies on Electrochemical Frequency Modulation (EFM) Technique

Corrosion Studies Related to Nuclear Reprocessing

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